Photomask and method of fabricating a photomask
US11982936B2 · kind B2 · utility
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1References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Jun 30, 2022 |
| Grant date | May 14, 2024 |
| Priority date | — |
| Expiry date | Jun 30, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/68
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of fabricating a photomask includes selectively exposing portions of a photomask blank to radiation to change an optical property of the portions of the photomask blank exposed to the radiation, thereby forming a pattern of exposed portions of the photomask blank and unexposed portions of the photomask blank. The pattern corresponds to a pattern of semiconductor device features.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.