Patent · US Active

Method for particle analysis and method for particle production

US11988636B2 · kind B2 · utility

0Cited by
3References
6Claims
0Family size

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Key dates

Filing dateApr 24, 2020
Grant dateMay 21, 2024
Priority date
Expiry dateJan 4, 2043

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N2333/39
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

The method for particle analysis includes a first magnetic susceptibility measurement step S4 of measuring a volume magnetic susceptibility of each of first particles p1; an encapsulation treatment step S5 of performing an encapsulation treatment so that the first particles p1 encapsulate an encapsulation target component pt smaller than the first particles p1; a second magnetic susceptibility measurement step S8 of measuring a volume magnetic susceptibility of each of second particles p2 as an analysis target that are the first particles p1 after the encapsulation treatment; and a step S9 of analyzing whether or not the encapsulation target component pt is encapsulated in the second particles p2 based on a result of measurement in the first magnetic susceptibility measurement step S4 and a result of measurement in the second magnetic susceptibility measurement step S8.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.