Dynamic monitoring and securing of factory processes, equipment and automated systems

US11989288B2 · kind B2 · utility

Assignee

• Nanotronics Imaging, Inc. · US

Inventors

• Matthew C. Putman · Brooklyn, US
• John B. Putman · Four Corners, US
• Vadim Pinskiy · Wayne, US
• Damas Limoge · Brooklyn, US
• Andrew Sundstrom · Brooklyn, US
• James Williams, III · New York, US

Key dates

• Filing date: Jun 28, 2023
• Grant date: May 21, 2024
• Expiry date: Jun 28, 2043

Classification

• Technology area (CPC —): General

Abstract

A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.