Patent · US Active

Apparatus and method for analyzing an element of a photolithography process with the aid of a transformation model

US12001145B2 · kind B2 · utility

0Cited by

5References

22Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Alexander Freytag · Erfurt, DE
Christoph Husemann · Jena, DE
Dirk Seidel · Jena, DE
Carsten Schmidt · Jena, DE
Thomas Scheruebl · Jena, DE

Key dates

Filing date	May 17, 2019
Grant date	Jun 4, 2024
Priority date	—
Expiry date	Aug 4, 2040

Classification

Technology area (CPC G)Physics
CPC primaryG06N20/00
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An apparatus for analyzing an element of a photolithography process, said apparatus comprising: (a) a first measuring apparatus for recording first data of the element; and (b) means for transforming the first data into second, non-measured data, which correspond to measurement data of a measurement of the element with a second measuring apparatus; (c) wherein the means comprise a transformation model, which has been trained using a multiplicity of first data used for training purposes and second data corresponding therewith, which are linked to the second measuring apparatus.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.