Material for plasma spray comprising Y—O—F compound, method for producing the same, and spray coating prepared using the same
US12018385B2 · kind B2 · utility
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5Claims
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Key dates
| Filing date | Jun 22, 2023 |
| Grant date | Jun 25, 2024 |
| Priority date | — |
| Expiry date | Jun 22, 2043 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC04B2235/80
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Disclosed are a material for spray for plasma spray coating having high plasma resistance and a method for producing the same. The material for plasma spray comprises an yttrium compound, and the numbers of moles of Y (yttrium), O (oxygen), and F (fluorine) in the yttrium compound satisfy 1.5<(O+F)/Y<2.0.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.