Gas distribution system and reactor system including same
US12024775B2 · kind B2 · utility
0Cited by
6References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 8, 2023 |
| Grant date | Jul 2, 2024 |
| Priority date | — |
| Expiry date | Jun 8, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32458
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A gas distribution system, a reactor system including the gas distribution system, and method of using the gas distribution system and reactor system are disclosed. The gas distribution system can be used in gas-phase reactor systems to independently monitor and control gas flow rates in a plurality of channels of a gas distribution system coupled to a reaction chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.