System and method for supplying and dispensing bubble-free photolithography chemical solutions
US12025917B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Dec 17, 2019 |
| Grant date | Jul 2, 2024 |
| Priority date | — |
| Expiry date | Apr 29, 2043 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/86187
- WIPO fieldHandling
- WIPO sectorMechanical engineering
Abstract
A method of supplying a chemical solution to a photolithography system. The chemical solution is pumped from a variable-volume buffer tank. The pumped chemical solution is dispensed in a spin-coater. The variable-volume buffer tank is refilled by emptying a storage container filled with the chemical solution into the variable-volume buffer tank.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.