Shih-Che Wang
17Patents
2h-index
48Co-inventors
54Inventor score
Filing activity: Nov 13, 1998 → Mar 13, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6420791B1 | Alignment mark design | Emerging Cross-Sectional Technologies | 55 | Expired |
| US6080659A | Method to form an alignment mark | Electricity | 12 | Expired |
| US8416393B2 | Cross quadrupole double lithography method and apparatus for semiconductor device fabrication using two apertures | Electricity | 2 | Active |
| US7838173B2 | Structure design and fabrication on photomask for contact hole manufacturing process window enhancement | Physics | 2 | Active |
| US10558120B2 | System and method for supplying and dispensing bubble-free photolithography chemical solutions | Emerging Cross-Sectional Technologies | 2 | Active |
| US10795270B2 | Methods of defect inspection | Electricity | 1 | Active |
| US7338909B2 | Micro-etching method to replicate alignment marks for semiconductor wafer photolithography | Electricity | 1 | Expired |
| US12001132B2 | Protection layer on low thermal expansion material (LTEM) substrate of extreme ultraviolet (EUV) mask | Electricity | 1 | Active |
| US11624985B2 | Methods of defect inspection | Electricity | 0 | Active |
| US9817315B2 | System and method for supplying and dispensing bubble-free photolithography chemical solutions | Emerging Cross-Sectional Technologies | 0 | Active |
| US11798800B2 | Method and apparatus for solvent recycling | Electricity | 0 | Active |
| US12025917B2 | System and method for supplying and dispensing bubble-free photolithography chemical solutions | Emerging Cross-Sectional Technologies | 0 | Active |
| US9280041B2 | Cross quadrupole double lithography method using two complementary apertures | Electricity | 0 | Active |
| US11545361B2 | Method and apparatus for coating photo resist over a substrate | Electricity | 0 | Active |
| US12362179B2 | Method and apparatus for coating photo resist over a substrate | Electricity | 0 | Active |
| US10274818B2 | Lithography patterning with sub-resolution assistant patterns and off-axis illumination | Physics | 0 | Active |
| US11955335B2 | Method and apparatus for coating photo resist over a substrate | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.