Method and apparatus for measuring displacement of an end effector
US12027395B2 · kind B2 · utility
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12Claims
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Key dates
| Filing date | Jun 16, 2021 |
| Grant date | Jul 2, 2024 |
| Priority date | — |
| Expiry date | Jul 11, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68707
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for measuring displacements of an end effector passing through a load lock gate of semiconductor equipment according to an embodiment of the present disclosure includes measuring a first displacement in a vertical direction and a second displacement in a horizontal direction of the end effector while the end effector passes through the load lock gate, calculating changes in pitch and roll of the end effector based on the measured first displacement, and calculating a change in yaw of the end effector based on the measured second displacement.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.