Laser interference photolithography system
US12038690B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Oct 23, 2020 |
| Grant date | Jul 16, 2024 |
| Priority date | — |
| Expiry date | Oct 23, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2053
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A laser interference photolithography system, comprising a laser device, a first reflector, a grating beam-splitter, a second reflector, a first universal reflector, a first lens, a second universal reflector, a second lens, a beam splitting prism, a control module, an angle measurement module, a third lens and a substrate. The control module comprises a signal processing terminal, a controller, and a driver. The signal processing terminal is connected to the angle measurement module, the controller is connected to both the signal processing terminal and the driver, and the driver is connected to both the first universal reflector and the second universal reflector. The laser emits a laser light that is split into two beams of light by the system, and the two beams of light are focused on the substrate for exposure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.