Substrate treatment apparatus and substrate treatment method
US12046487B2 · kind B2 · utility
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11References
4Claims
0Family size
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Key dates
| Filing date | May 10, 2021 |
| Grant date | Jul 23, 2024 |
| Priority date | — |
| Expiry date | Feb 23, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/31111
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
According to embodiments, a substrate treatment apparatus includes a housing, a heater and a pipe. The housing stores solution containing phosphoric acid and houses a substrate including a silicon substrate. The heater heats the solution over a normal boiling point of the solution. The pipe supplies heated solution heated by the heater into the housing while generating air bubbles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.