Multilayer ALD coating for critical components in process chamber
US12049697B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 8, 2022 |
| Grant date | Jul 30, 2024 |
| Priority date | — |
| Expiry date | Aug 8, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32495
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method includes forming a first coating comprising amorphous rare earth metal-containing oxide on a surface of an article using a first atomic layer deposition (ALD) process that includes repeating a process of alumina deposition cycles followed by rare earth metal oxide deposition cycles N1 times. The method also includes forming a second coating comprising crystalline rare earth metal oxide on the first coating using a second ALD process. The method also includes forming a third coating comprising amorphous rare earth metal-containing oxide on the second coating using a third ALD process that includes repeating a process of alumina deposition cycles followed by rare earth metal oxide deposition cycles N2 times. The method also includes forming a fourth coating comprising crystalline rare earth metal oxide on the third coating using a fourth ALD process. In some embodiments, a ratio of N1 to N2 is between about 100 and about 150.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.