Patent · US Active

System for storing chemical liquid and method for adjusting gas concentration in chemical liquid

US12053745B2 · kind B2 · utility

0Cited by
2References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 12, 2019
Grant dateAug 6, 2024
Priority date
Expiry dateDec 27, 2042

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67075
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

Chemical liquid is injected into a tank. A concentration of a first gas dissolved in the chemical liquid is detected. Based on the detected concentration of the first gas, at least one of the first gas and a second gas is injected into the tank to sustain at least one of the concentration of the first gas and a concentration of the second gas in a range of a target value.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.