System for storing chemical liquid and method for adjusting gas concentration in chemical liquid
US12053745B2 · kind B2 · utility
0Cited by
2References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 12, 2019 |
| Grant date | Aug 6, 2024 |
| Priority date | — |
| Expiry date | Dec 27, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67075
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Chemical liquid is injected into a tank. A concentration of a first gas dissolved in the chemical liquid is detected. Based on the detected concentration of the first gas, at least one of the first gas and a second gas is injected into the tank to sustain at least one of the concentration of the first gas and a concentration of the second gas in a range of a target value.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.