Data processing method and system for detection of deterioration of semiconductor process kits
US12055498B2 · kind B2 · utility
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Key dates
| Filing date | Jun 28, 2021 |
| Grant date | Aug 6, 2024 |
| Priority date | — |
| Expiry date | Oct 30, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/30
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A data processing method for detection of deterioration of semiconductor process kits includes the following steps: acquiring a plurality of Raman spectra data of a semiconductor process kit and performing a plurality calculating processes on the Raman spectra data to obtain a first deterioration state determining parameter indicating the aging degree of the entire semiconductor process kit and a second deterioration state determining parameter indicating the degree of variation of the internal molecular structure of the semiconductor process kit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.