Substrate cleaning solution, and using the same, method for manufacturing cleaned substrate and method for manufacturing device
US12068150B2 · kind B2 · utility
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17Claims
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Key dates
| Filing date | Dec 12, 2019 |
| Grant date | Aug 20, 2024 |
| Priority date | — |
| Expiry date | Oct 23, 2040 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
[Problem] To obtain a substrate cleaning solution capable of cleaning a substrate and removing particles.[Means for Solution] The present invention is a substrate cleaning solution comprising an insoluble or hardly soluble solute (A), a soluble solute (B), and a solvent (C).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.