Multi-depth film for optical devices
US12084761B2 · kind B2 · utility
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10References
7Claims
0Family size
Assignee
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Key dates
| Filing date | Feb 17, 2023 |
| Grant date | Sep 10, 2024 |
| Priority date | — |
| Expiry date | Feb 17, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/132
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Embodiments of the present disclosure relate to forming multi-depth films for the fabrication of optical devices. One embodiment includes disposing a base layer of a device material on a surface of a substrate. One or more mandrels of the device material are disposed on the base layer. The disposing the one or more mandrels includes positioning a mask over of the base layer. The device material is deposited with the mask positioned over the base layer to form an optical device having the base layer with a base layer depth and the one or more mandrels having a first mandrel depth and a second mandrel depth.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.