Photoresist compositions and pattern formation methods
US12085854B2 · kind B2 · utility
0Cited by
6References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 30, 2021 |
| Grant date | Sep 10, 2024 |
| Priority date | — |
| Expiry date | Mar 10, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0397
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist composition comprising a polymer, a photoacid generator, an additive comprising a tertiary carbon atom as a ring-forming atom of a lactone ring, and a solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.