Method for generating a control scheme and device manufacturing method
US12085913B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Mar 19, 2020 |
| Grant date | Sep 10, 2024 |
| Priority date | — |
| Expiry date | Apr 24, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B2219/50296
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for generating a sampling scheme for a device manufacturing process, the method including: obtaining a measurement data time series of a plurality of processed substrates; transforming the measurement data time series to obtain frequency domain data; determining, using the frequency domain data, a temporal sampling scheme; determining an error offset introduced by the temporal sampling scheme on the basis of measurements on substrates performed according to the temporal sampling scheme; and determining an improved temporal sampling scheme to compensate the error offset.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.