Correcting aberration and apodization of an optical system using correction plates
US12092814B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 12, 2022 |
| Grant date | Sep 17, 2024 |
| Priority date | — |
| Expiry date | Nov 12, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B27/58
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical system with aberration correction is disclosed. The optical system may include an illumination source. The optical system may include a detector. The optical system may include one or more collection optics configured to image a sample onto the detector based on illumination from the illumination source. The optical system may include two or more aberration correction plates located in one or more pupil planes of the one or more collection optics. The two or more aberration correction plates may provide at least partial correction of two or more linearly-independent aberration terms. Any particular one of the two or more aberration correction plates may have a spatially-varying thickness profile providing a selected amount of correction for a single particular aberration term of the two or more linearly-independent aberration terms.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.