Patent · US Active

Single-beam photothermal measurement apparatus and measurement method for absorptive defects

US12099002B2 · kind B2 · utility

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4References

3Claims

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Inventors

Shijie Liu · Shanghai, CN
Kaizao Ni · Shanghai, CN
Jianda Shao · Shanghai, CN
Weiwei WANG · Beijing, CN
Tianzhu Xu · Shanghai, CN
Yingjia Li · Shanghai, CN
Qi Lu · Zhejiang, CN

Key dates

Filing date	Dec 30, 2021
Grant date	Sep 24, 2024
Priority date	—
Expiry date	Nov 20, 2042

Classification

Technology area (CPC G)Physics
CPC primaryG01N2201/0636
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A single-beam photothermal measurement apparatus and a measurement method for absorptive defects. The apparatus comprises a common-path-type structure and a non-common-path-type structure. The present invention is simple in optical structure and convenient to align and adjustment. The measurement result is stable, and measurement signal anomalies caused by environmental vibration and sample tilt are avoided. By detecting a power change on the edge of a beam spot, the measurement sensitivity of a system is remarkably improved.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.