Patent · US Active

Faceplate having a curved surface

US12110590B2 · kind B2 · utility

0Cited by

2References

18Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Shailendra Srivastava · Fremont, US
Sai Susmita Addepalli · San Jose, US
Nikhil Sudhindrarao Jorapur · Sunnyvale, US
Daemian Raj Benjamin Raj · Fremont, US
Amit Kumar BANSAL · Milpitas, US
Juan Carlos Rocha-Alvarez · Redwood City, US
Gregory Eugene CHICHKANOFF · Mountain View, US
Xinhai Han · Santa Clara, US
Masaki Ogata · San Jose, US
Kristopher Enslow · Carlsbad, US
Wenjiao Wang · San Jose, US

Key dates

Filing date	Oct 18, 2023
Grant date	Oct 8, 2024
Priority date	—
Expiry date	Oct 18, 2043

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/3321
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A faceplate for a substrate process chamber comprises a first and second surface. The second surface is shaped such that the second surface includes a peak and a distance between the first and second surface varies across the width of the faceplate. The second surface of the faceplate is exposed to a processing volume of the process chamber. Further, the faceplate may be part of a lid assembly for the process chamber. The lid assembly may include a blocker plate facing the first surface of the faceplate. A distance between the blocker plate and the first surface is constant.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.