Patent · US Active

Method for producing a mirror of a microlithographic projection exposure apparatus

US12117731B2 · kind B2 · utility

0Cited by

3References

17Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Christoph Zaczek · Heubach, DE
Erik Loopstra · Eindhoven, NL
Eric Eva · Aalen, DE
Drew Chieda · Wilton, US
Matthew Lipson · Sunnyvale, US
Victor Antonio PEREZ-FALCON · Bridgeport, US
Moshe SHEMESH · Holon, IL

Key dates

Filing date	Dec 13, 2022
Grant date	Oct 15, 2024
Priority date	—
Expiry date	Dec 13, 2042

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC03B25/025
WIPO fieldOptics
WIPO sectorInstruments

Abstract

This disclosure relates to a method for producing a mirror of a microlithographic projection exposure apparatus, a first mirror part and a second mirror part being provided, which are in contact in the region of a first connecting surface of the first mirror part and a second connecting surface of the second mirror part. For forming a durable connection between the first mirror part and the second mirror part, the first mirror part and the second mirror part are heated up to a holding temperature of at least 400° C. and are kept at the holding temperature during a holding time. After the holding time has elapsed, the first mirror part and the second mirror part are cooled down to a first cooling temperature at a first cooling rate of less than or equal to 100 K/h.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.