Patent · US Active

Particle beam system and the use thereof for flexibly setting the current intensity of individual particle beams

US12119204B2 · kind B2 · utility

0Cited by

94References

21Claims

0Family size

Assignee

Carl Zeiss MultiSEM GmbH · DE

Inventors

Stefan Schubert · Oberkochen, DE
Dirk Zeidler · Oberkochen, DE
Georgo Metalidis · Zang, DE
Hans Fritz · Grabs, CH
Ralf Lenke · Lauchheim, DE

Key dates

Filing date	Jan 11, 2022
Grant date	Oct 15, 2024
Priority date	—
Expiry date	Oct 31, 2042

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/1215
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A particle beam system and, such as a multi-beam particle microscope, can have a current intensity of individual particle beams that is flexibly set over large value ranges without structural modifications. The particle beam system can include a condenser lens system, a pre-multi-lens array with a specific pre-counter electrode and a pre-multi-aperture plate, and a multi-lens array. The system can includes a controller to supply adjustable excitations to the condenser lens system and the pre-counter electrode so that the charged particles are incident on the pre-multi-aperture plate in telecentric manner.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.