Filter unit, substrate treating apparatus including the same, and substrate treating method
US12125678B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 21, 2020 |
| Grant date | Oct 22, 2024 |
| Priority date | — |
| Expiry date | Sep 3, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH03H1/00
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate treating apparatus is disclosed. The substrate treating apparatus may include a chamber having a treating space defined therein, a support unit for supporting the substrate in the treating space, a heater power source for applying electric power to a heater in the support unit, a high-frequency power source for applying high-frequency power to a lower electrode in the support unit, and a filter unit installed at a line for connecting the heater power source with the heater to prevent high-frequency inflow. The filter unit may include a housing, one or more coils in the housing, and an adjustment member disposed between the housing and the coil. The adjustment member may be made of a non-magnetic material. The adjustment member may be spaced from the coil at a predefined spacing, and spaced apart from an inner wall of the housing or in contact with the housing inner wall.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.