Oxidation-resistant metallic tin
US12129529B2 · kind B2 · utility
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Key dates
| Filing date | Feb 27, 2020 |
| Grant date | Oct 29, 2024 |
| Priority date | — |
| Expiry date | May 31, 2040 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25C1/14
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
In the present invention, a high-purity metallic tin suitable for use in an EUV exposure device is provided through use of an oxidation-resistant metallic tin, the oxidation-resistant metallic tin containing 99.995 mass % or more of tin, and unavoidable impurities, and the thickness of an oxide film being 2.0 nm or less when the surface of a cut face of the oxidation-resistant metallic tin is measured by AES.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.