Shiro Tsukamoto
24Patents
4h-index
22Co-inventors
63Inventor score
Filing activity: Apr 18, 1989 → Feb 27, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5062140A | Induction speaker | Electricity | 27 | Expired |
| US7951275B2 | Sputtering target and method for finishing surface of such target | Chemistry; Metallurgy | 16 | Active |
| USD318287S | Portable electronic calculator | General | 10 | Expired |
| US8663440B2 | Titanium target for sputtering | Chemistry; Metallurgy | 5 | Active |
| US9371578B2 | Tantalum coil for sputtering and method for processing the coil | Electricity | 2 | Active |
| US9068258B2 | Titanium target for sputtering | Chemistry; Metallurgy | 2 | Active |
| US9536715B2 | Recycling method for tantalum coil for sputtering and tantalum coil obtained by the recycling method | Emerging Cross-Sectional Technologies | 2 | Active |
| US7122848B2 | Substrate bonded transition metal catalyst and method for preparation thereof | Emerging Cross-Sectional Technologies | 2 | Expired |
| US8728255B2 | Pot-shaped copper sputtering target and manufacturing method thereof | Electricity | 2 | Active |
| US6383286B1 | Method of making semiconductor super-atom and aggregate thereof | Emerging Cross-Sectional Technologies | 2 | Expired |
| US8183073B2 | Method of manufacturing a semiconductor device with quantum dots formed by self-assembled growth | Electricity | 2 | Active |
| US6074485A | Crystal growth observing apparatus using a scanning tunneling microscope | Emerging Cross-Sectional Technologies | 1 | Expired |
| US10006117B2 | Sputtering target-backing plate assembly and method for producing same | Electricity | 1 | Active |
| US9347130B2 | Lanthanum target for sputtering | Chemistry; Metallurgy | 0 | Active |
| US9711336B2 | Backing plate-integrated metal sputtering target and method of producing same | Performing Operations; Transporting | 0 | Active |
| US9382612B2 | Lanthanum target for sputtering | Electricity | 0 | Active |
| US9328411B2 | Ytterbium sputtering target and method of producing said target | Chemistry; Metallurgy | 0 | Active |
| US10167547B2 | Gadolinium sputtering target and production method of said target | Electricity | 0 | Active |
| US9530628B2 | Titanium target for sputtering | Chemistry; Metallurgy | 0 | Active |
| US9666418B2 | Titanium target for sputtering | Chemistry; Metallurgy | 0 | Active |
| US7892871B2 | Method of manufacturing semiconductor device with quantum dots formed by self-assembled growth | Electricity | 0 | Active |
| US10781024B2 | Method for vacuum packing high-purity tin and vacuum-packed high purity tin | Performing Operations; Transporting | 0 | Active |
| US10431438B2 | Titanium target for sputtering and manufacturing method thereof | Chemistry; Metallurgy | 0 | Active |
| US12129529B2 | Oxidation-resistant metallic tin | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.