Optical system and lithography apparatus
US12130557B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 10, 2022 |
| Grant date | Oct 29, 2024 |
| Priority date | — |
| Expiry date | Aug 10, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70891
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical system comprises at least one mirror having a mirror body and a mirror surface, and at least one actuator device coupled to the mirror body and serving for deforming the mirror surface. The actuator device comprises at least one electrostrictive actuator element for generating a mechanical stress in the mirror body for deforming the mirror surface depending on an electrical drive voltage, and at least one electrostrictive sensor element for outputting a sensor signal depending on a deformation of the sensor element. The at least one sensor element is arranged directly adjacent to the actuator element and/or is arranged in such a way that it is configured at least partly for transferring the mechanical stress generated by the actuator element to the mirror body.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.