Automatic wafer carrying system and method for transferring wafer using the system
US12131938B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 22, 2021 |
| Grant date | Oct 29, 2024 |
| Priority date | — |
| Expiry date | May 2, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68792
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An automatic wafer carrying system and a method for transferring a wafer using the system are provided. The system includes: a vacuum chamber, including a plurality of wafer carrying stations; a plurality of first paddles and second paddles, all located inside the vacuum chamber and capable of rotating synchronously separately, where each of the plurality of second paddles and a corresponding first paddle form a pair of paddles to carry a wafer jointly; a double-ferrule magnetofluid, connected to the vacuum chamber in a sealed manner, and connected to the plurality of first paddles and the plurality of second paddles, to drive the first paddles or the second paddles or both the first and second paddles to rotate; a first drive mechanism, connected to the double-ferrule magnetofluid, to drive the plurality of first paddles and the plurality of second paddles through the double-ferrule magnetofluid to rotate synchronously in the same direction; and a second drive mechanism, also connected to the double-ferrule magnetofluid, to implement relative rotation of the plurality of first paddles and the plurality of second paddles through the double-ferrule magnetofluid. The system can reduc…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.