Systems and methods for casting sputtering targets
US12134125B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 12, 2021 |
| Grant date | Nov 5, 2024 |
| Priority date | — |
| Expiry date | Feb 12, 2041 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/3414
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Methods for manufacturing rotary target materials that allow a material to be cast in a melting zone of a casting vessel while the vessel is rotated such that a melting zone is below a casting zone. The vessel is sealed and the pressure inside the vessel is reduced and the exterior of the vessel is heated. The melting zone of the vessel is heated to a temperature that melts the material and releases any trapped gasses which can be pumped out using the vacuum pump. Once the melting zone and molten material have reached a specified temperature, outgassed, and the casting zone has reached a temperature to maximize adhesion and reduce voids and defects, the vessel is rotated until the melting zone is directly above the casting zone to transfer the material from the melting zone to the casting zone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.