Patrick Lawrence Morse
14Patents
1h-index
10Co-inventors
47Inventor score
Filing activity: Jun 6, 2008 → Jan 7, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8535490B2 | Rotatable magnetron sputtering with axially movable target electrode tube | Electricity | 2 | Active |
| US9388490B2 | Rotary magnetron magnet bar and apparatus containing the same for high target utilization | Electricity | 1 | Active |
| US10699885B2 | Dual power feed rotary sputtering cathode | Electricity | 1 | Active |
| US9406487B2 | Plasma enhanced chemical vapor deposition (PECVD) source | Electricity | 1 | Active |
| US9312108B2 | Sputtering apparatus | Electricity | 1 | Active |
| US9362093B2 | Plasma enhanced chemical vapor deposition (PECVD) source | General | 0 | Revoked |
| US11603589B2 | Systems and methods for additive manufacturing for the deposition of metal and ceramic materials | Electricity | 0 | Active |
| US12134125B2 | Systems and methods for casting sputtering targets | Chemistry; Metallurgy | 0 | Active |
| US9418823B2 | Sputtering apparatus | Electricity | 0 | Active |
| US10727034B2 | Magnetic force release for sputtering sources with magnetic target materials | Electricity | 0 | Active |
| US10273570B2 | Rotary magnetron magnet bar and apparatus containing the same for high target utilization | Electricity | 0 | Active |
| US11908669B2 | Thermally controlled magnetic fields optimization system for sputter deposition processes | Electricity | 0 | Active |
| US9758862B2 | Sputtering apparatus | Electricity | 0 | Active |
| US9198274B2 | Ion control for a plasma source | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.