Patent · US Active

Devices and methods for examining and/or processing an element for photolithography

US12135540B2 · kind B2 · utility

0Cited by

3References

24Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Michael Budach · Hanau, DE
Nicole Auth · Gustavsburg, DE
Christian Rensing · Bensheim, DE
Alexander Freytag · Erfurt, DE
Christian Wojek · Aalen, DE

Key dates

Filing date	Dec 11, 2020
Grant date	Nov 5, 2024
Priority date	—
Expiry date	Sep 6, 2043

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/31744
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A device for examining and/or processing an element for photolithography with a beam of charged particles, the device including (a) means for acquiring measurement data while the element for photolithography is exposed to the beam of charged particles; and (b) means for predetermining a drift of the beam of charged particles relative to the element for photolithography with a trained machine learning model and/or a predictive filter. The trained machine learning model and/or the predictive filter use(s) at least the measurement data as input data.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.