System for inspecting and grounding a mask in a charged particle system
US12142451B2 · kind B2 · utility
0Cited by
5References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 21, 2020 |
| Grant date | Nov 12, 2024 |
| Priority date | — |
| Expiry date | Jul 7, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system for grounding a mask using a grounding component are provided. Some embodiments of the system include a grounding component comprising a base and an extension protruding from the base and comprising a conductive prong configured to contact a conductive layer of the mask. Some embodiments of the system include a plurality of conductive prongs configured to contact multiple positions of a conductive layer of the mask. Some other embodiments of the system include an extension comprising various shapes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.