Use of compositions comprising a solvent mixture for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below

US12146125B2 · kind B2 · utility

Assignee

• BASF SE

Inventors

• Marcel Brill · Ludwigshafen, DE
• Daniel LOEFFLER · Ludwigshafen, DE
• Yeni Burk · Ludwigshafen, DE
• Frank Oliver Heinrich Pirrung · Ludwigshafen am Rhein, DE
• Lothar Alexander Engelbrecht · Berlin, DE
• Szilard Csihony · Ludwigshafen, DE
• Maike Bergeler · Ludwigshafen, DE
• Volodymyr Boyko · Mannheim, DE
• Patrick Wilke · Ludwigshafen, DE

Key dates

• Filing date: May 13, 2019
• Grant date: Nov 19, 2024
• Expiry date: Oct 19, 2041

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C11D2111/22
• WIPO field: Basic materials chemistry
• WIPO sector: Chemistry

Abstract

The invention relates to the use of a composition comprising a C1 to C6 alkanol and a carboxylic acid ester of formula (I) wherein R1 is selected from a C1 to C6 alkyl, which may be unsubstituted or substituted by OH or F, and —X21—[O—X22]n—H; R2 is selected from a C1 to C6 alkyl, which may be unsubstituted or substituted by OH or F, and —X21—[O—X22]n—H; X21, X22 are independently selected from C1 to C6 alkandiyl, which may be unsubstituted or substituted by OH or F; n is an integer from 1 to 5. wherein, the C1 to C6 alkanol and the carboxylic acid ester are selected so as to form an azeotropic mixture and are present in an amount from 20% by weight below to 20% by weight above such azeotropic mixture.