Ruthenium removal composition and method of producing magnetoresistive random access memory
US12150386B2 · kind B2 · utility
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3References
9Claims
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Key dates
| Filing date | Aug 16, 2022 |
| Grant date | Nov 19, 2024 |
| Priority date | — |
| Expiry date | Aug 16, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10N50/10
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A treatment liquid contains orthoperiodic acid and water, and the pH is 11 or more. It is preferable that the content of orthoperiodic acid in the treatment liquid is 0.01% to 5% by mass with respect to the total mass of the treatment liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.