Method of using a dual stage lithographic apparatus and lithographic apparatus
US12153354B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 21, 2020 |
| Grant date | Nov 26, 2024 |
| Priority date | — |
| Expiry date | Apr 16, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70725
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of using a dual stage lithographic apparatus, wherein the lithographic apparatus includes: two substrate supports each arranged to move and support a substrate, a measure field in which selectively one of the two substrate supports is positioned to measure a feature of the substrate supported by the respective one of the two substrate supports, and an expose field in which selectively one of the two substrate supports is positioned to expose the substrate supported by the respective one of the two substrate supports to a patterned beam of radiation, the method including thermal relaxation of a substrate loaded on one of the two substrate supports, wherein the thermal relaxation is at least partially performed at the expose field and/or in transfer between the measure field and the expose field.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.