Patent · US Active

Dielectric-to-metal adhesion promotion material

US12159825B2 · kind B2 · utility

0Cited by
6References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 10, 2021
Grant dateDec 3, 2024
Priority date
Expiry dateApr 6, 2043

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K2203/125
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An electronic substrate may be formed having at least one metal-to-dielectric adhesion promotion material layer therein. The electronic substrate may comprise a conductive metal trace, a dielectric material layer on the conductive metal trace, and the adhesion promotion material layer between the conductive metal trace and the dielectric material layer, wherein the adhesion promotion material layer comprises an organic adhesion material and a metal constituent dispersed within the organic adhesion material, wherein a metal within the metal constituent has a standard reduction potential greater than a standard reduction potential of the conductive metal trace.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.