Patent · US Active

Method for generating a mathematical model for positioning individual mirrors of a facet mirror in an optical system

US12164102B2 · kind B2 · utility

0Cited by

4References

16Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Norman Kretzschmar · Aalen, DE
Ulrich Mueller · Hamburg, DE
Markus Holz · Aalen, DE

Key dates

Filing date	Nov 11, 2021
Grant date	Dec 10, 2024
Priority date	—
Expiry date	May 29, 2043

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/7085
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method for generating a mathematical model (MM) for positioning individual mirrors (204, 204′) of a facet mirror (200) in an optical system (500), e.g. in a lithography apparatus (100A, 100B). The method includes: a) providing (S701) target positions (SP) of the individual mirrors (204, 204′) with an adjustment unit (502), b) capturing (S702) actual measurement positions (MI) of the individual mirrors (204, 204′) with a measuring device (508), which is embodied as an interferometer, deflectometer and/or camera, and c) generating (S705) a mathematical model (MM) for positioning the individual mirrors (204, 204′) based on the captured actual measurement positions (MI) and the target positions (SP). In step c), a difference (EA) is formed (S703) between a respective actual measurement position (MI) and a respective target position (SP) and the mathematical model (MM) is generated (S705) based on the difference (EA) formed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.