Resist composition and method for producing resist pattern
US12164229B2 · kind B2 · utility
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15Claims
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Key dates
| Filing date | Dec 23, 2019 |
| Grant date | Dec 10, 2024 |
| Priority date | — |
| Expiry date | Apr 29, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/32
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A resist composition includes a novolak resin in which a hydroxy group is substituted with a group represented by formula (3), an acid generator, a quencher, and a solvent: wherein, in formula (3), Ra10 represents a hydrocarbon group having 1 to 20 carbon atoms (e.g., a chain hydrocarbon group such as an alkyl group, an alkenyl group and an alkynyl group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, groups formed by combining these groups, etc.) and * represents a bond.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.