Nanoscale thin film deposition systems
US12168244B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 25, 2021 |
| Grant date | Dec 17, 2024 |
| Priority date | — |
| Expiry date | Feb 25, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B27/0025
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and system for nanoscale precision programmable profiling on substrates. Profiling material is dispensed on a substrate or a superstrate. The superstrate is brought in contact with the substrate. The profiling material is then cured after bringing the superstrate in contact with the substrate. The superstrate is separated from the substrate after curing. An optical metrology of points on the substrate corresponding to the final substrate profile is then performed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.