Patent · US Active

Nanoscale thin film deposition systems

US12168244B2 · kind B2 · utility

0Cited by
3References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 25, 2021
Grant dateDec 17, 2024
Priority date
Expiry dateFeb 25, 2041

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B27/0025
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A method and system for nanoscale precision programmable profiling on substrates. Profiling material is dispensed on a substrate or a superstrate. The superstrate is brought in contact with the substrate. The profiling material is then cured after bringing the superstrate in contact with the substrate. The superstrate is separated from the substrate after curing. An optical metrology of points on the substrate corresponding to the final substrate profile is then performed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.