Vertical motion protection method and device based on dual-stage motion system of photolithography machine
US12169367B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 4, 2021 |
| Grant date | Dec 17, 2024 |
| Priority date | — |
| Expiry date | Jun 27, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70725
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed are a vertical motion protection method and device based on a dual-stage motion system of a photolithography machine. The method comprises: according to a distance between measured points and reference points of the eddy current sensor and coordinates of the reference points of the eddy current sensor, calculating coordinates of the measured points on a lower surface of the micro-motion stage respectively; calculating a point normal form equation of the micro-motion stage at the current time using measured coordinates of the measured points on the micro-motion stage, then substituting X and Y coordinates of the measured points on the translated micro-motion stage to determine a maximum height of the micro-motion stage at the current time; and comparing the maximum height with a height threshold, if the maximum height exceeds the height threshold, shutting down for protection, or else continuing to operate the system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.