Patent · US Active

Method for producing a substrate for an optical element

US12196986B2 · kind B2 · utility

0Cited by

13References

8Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Andreas Schmehl · Deiningen, DE
Heiko Siekmann · Aalen, DE

Key dates

Filing date	Nov 16, 2020
Grant date	Jan 14, 2025
Priority date	—
Expiry date	Aug 13, 2043

Classification

Technology area (CPC G)Physics
CPC primaryG02B5/085
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A method for producing a substrate (10) for an optical element (11) includes: introducing a starting material, preferably a metal or a semimetal, into a container and melting the starting material, producing a material body having a quasi-monocrystalline volume region (8) by directionally solidifying the molten starting material proceeding from a plurality of monocrystalline seed plates arranged in the region of a base of the container, and producing the substrate by processing the material body to form an optical surface (12). An associated reflective optical element (11), in particular for reflecting EUV radiation (14) includes: a substrate having an optical surface on which a reflective coating (13) is applied. The substrate is typically produced in accordance with the associated method and has a quasi-monocrystalline volume region (8).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.