Heiko Siekmann
8Patents
2h-index
23Co-inventors
47Inventor score
Filing activity: Aug 5, 2008 → Nov 16, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8976927B2 | Substrate for mirrors for EUV lithography | Physics | 3 | Active |
| US8395756B2 | Illumination system for a microlithographic projection exposure apparatus | Physics | 2 | Active |
| US7880969B2 | Optical integrator for an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 2 | Active |
| US9217930B2 | Illumination system for a microlithographic projection exposure apparatus | Physics | 1 | Active |
| US8520307B2 | Optical integrator for an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 1 | Active |
| US9541685B2 | Method for producing a reflective optical component for an EUV projection exposure apparatus and component of this type | Physics | 0 | Active |
| US9575414B2 | Illumination system for a microlithographic projection exposure apparatus | Physics | 0 | Active |
| US12196986B2 | Method for producing a substrate for an optical element | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.