Exposure system and method for manufacturing electronic devices
US12197132B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 3, 2022 |
| Grant date | Jan 14, 2025 |
| Priority date | — |
| Expiry date | Jan 14, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/02415
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure system according to an aspect of the present disclosure includes a laser apparatus that outputs pulsed laser light, an illuminating optical system that guides the pulsed laser light to a reticle, a reticle stage, and a processor that controls the output of the pulsed laser light from the laser apparatus and the movement of the reticle performed by the reticle stage. The reticle has a first region where a first pattern is disposed and a second region where a second pattern is disposed, and the first and second regions are each a region continuous in a scan width direction perpendicular to a scan direction of the pulsed laser light, with the first and second regions arranged side by side in the scan direction. The processor controls the laser apparatus to output the pulsed laser light according to each of the first and second regions by changing the values of control parameters of the pulsed laser light in accordance with each of the first and second regions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.