Semiconductor component with a stress compensation layer and a method for manufacturing a semiconductor component
US12206044B2 · kind B2 · utility
0Cited by
2References
12Claims
0Family size
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Key dates
| Filing date | Jul 31, 2019 |
| Grant date | Jan 21, 2025 |
| Priority date | — |
| Expiry date | Dec 24, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S2301/176
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A semiconductor device may include a conductive layer over a semiconductor body and a first stress compensation layer adjacent to the conductive layer. The stress compensation layer may include a defined first stress.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.