Patent · US Active

Apparatus for providing a liquefied material, dosage system and method for dosing a liquefied material

US12209303B2 · kind B2 · utility

0Cited by

0References

20Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Andreas Sauer · Großostheim, DE
Volker Hacker · Schongau, DE
Thomas DEPPISCH · Aschaffenburg, DE
Ralf SCHEIDT · Merchweiler, DE

Key dates

Filing date	Dec 28, 2021
Grant date	Jan 28, 2025
Priority date	—
Expiry date	Dec 8, 2042

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02E60/10
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A vapor deposition apparatus is provided. The vapor deposition apparatus includes a tank for providing a liquefied material, a first unit having an alterable first volume, the first unit including a first actuator and including a first line to be in fluid communication with the tank. Further, the vapor deposition apparatus includes a second unit having an alterable second volume, the second unit including a second actuator and including a second line to be in fluid communication with the tank. The vapor deposition apparatus includes an evaporation arrangement, the evaporation arrangement being in fluid communication with the first unit and the second unit. The first actuator and the second actuator are configured to alternatingly provide a force to the alterable first volume and the alterable second volume for providing the liquefied material to the evaporation arrangement.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.