Charged particle beam device
US12211665B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 22, 2024 |
| Grant date | Jan 28, 2025 |
| Priority date | — |
| Expiry date | Feb 22, 2044 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/202
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A charged particle beam device suppresses sample deformation caused by placing a sample on a suctioning surface of an electrostatic chuck mechanism, the sample having a temperature different from the suctioning surface. The charged particle beam device includes the electrostatic chuck mechanism; a stage which moves a sample, which is to be irradiated with a charged particle beam, relative to an irradiation position of the charged particle beam; an insulating body which is disposed on the stage and constitutes a dielectric layer of the electrostatic chuck; a first support member which supports the insulating body on the stage; a ring-shaped electrode which encloses the surroundings of the sample and is installed on the insulating body in a contactless manner, and to which a predetermined voltage is applied; and a second support member which supports the ring-shaped electrode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.