Method of cleaning a surface
US12217954B2 · kind B2 · utility
0Cited by
2,210References
19Claims
0Family size
Assignee
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Key dates
| Filing date | Aug 20, 2021 |
| Grant date | Feb 4, 2025 |
| Priority date | — |
| Expiry date | Jun 3, 2043 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Methods for cleaning a substrate are disclosed. The substrate comprises a dielectric surface and a metal surface. The methods comprise providing a cleaning agent to the reaction chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.