Pupil ellipsometry measurement apparatus and method and method of fabricating semiconductor device using the pupil ellipsometry measurement method
US12228499B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 17, 2023 |
| Grant date | Feb 18, 2025 |
| Priority date | — |
| Expiry date | Aug 2, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/214
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Provided is a pupil ellipsometry measurement apparatus configured to measure an object, the pupil ellipsometry measurement apparatus including a stage configured to support the object to be measured, a light source unit configured to generate and output light, an irradiation optical system configured to focus the light from the light source unit on the object, a first detector configured to detect an image of reflected light from the object on an imaging plane, a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light, a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane, and a processor configured to reconstruct reflectance information based on the hologram image, and measure the object.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.