Magnetic annealing equipment and method
US12235045B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 25, 2022 |
| Grant date | Feb 25, 2025 |
| Priority date | — |
| Expiry date | Jul 16, 2043 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF27D2007/066
- WIPO fieldThermal processes and apparatus
- WIPO sectorMechanical engineering
Abstract
The disclosure describes equipment for magnetic annealing of a substrate, the equipment including: an anneal chamber configured to heat and cool a substrate held at a soak location along a first direction in the anneal chamber, the anneal chamber including: a heater, a cooler, and a substrate lifter including a substrate holder, where the substrate holder is configured to support a substrate oriented such that the first direction is perpendicular to a major surface of the substrate; and a magnet assembly configured to establish a homogeneous zone in the anneal chamber, the soak location being within the homogeneous zone, the homogeneous zone including a region of magnetic field.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.