Device and method for measuring the profile of flat objects comprising unknown materials
US12235209B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 14, 2020 |
| Grant date | Feb 25, 2025 |
| Priority date | — |
| Expiry date | Jul 5, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/0641
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and device for measuring the profile of the surface of a flat object of unknown materials, including an interferometry measuring system, ellipsometry measuring system, beam splitter for splitting a light beam of a light source into an interferometry light beam and an ellipsometry light beam, and an analysis unit designed to ascertain the profile height in the measured region on the object surface from an analysis beam analyzed in a detector unit of the interferometry measuring system and a sensor beam received in an ellipsometry sensor. The interferometry measuring system includes a beam divider, reference mirror, and the detector unit, and the ellipsometry measuring system includes a polarizer for polarizing an ellipsometry light beam and transmitting same onto the measuring region on the object surface as well as the ellipsometry sensor, which includes a polarization filter in order to determine the polarization state of a received sensor beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.